Metallic quantum dots fabricated by a superlattice structure

Details Metallic quantum dots fabricated by a superlattice structure Metallic quantum dots fabricated by a superlattice structure

2007-12-18

2007-12-18

Coleman, David W. (Department: 2823)

Semiconductor device manufacturing: process

Bonding of plural semiconductor substrates

Subsequent separation into plural bodies

C977S888000, C977S893000

Reexamination Certificate

active

11271354

ABSTRACT:
A method for forming quantum dots includes forming a superlattice structure that includes at least one nanostrip protruding from the superlattice structure, providing a quantum dot substrate, transferring the at least one nanostrip to the quantum dot substrate, and removing at least a portion of the at least one nanostrip from the substrate. The superlattice structure is formed by providing a superlattice substrate, forming alternating layers of first and second materials on the substrate to form a stack, cleaving the stack to expose the alternating layers, and etching the exposed alternating layers with an etchant that etches the second material at a greater rate than the first to form the at least one nanostrip.

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