Metallic modified material of intermetallic compound

Specialized metallurgical processes – compositions for use therei – Processes – Free metal or alloy reductant contains magnesium

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75134P, 204192SP, 204192S, 204192P, 252 623GA, 423299, 423409, C01C 1500

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042382327

ABSTRACT:
The present invention is concerned with a new metallic modified material of intermetallic compound, which has the same chemical composition as an intermetallic compound semi-conductor with a zincblende-type or wurtzite-type crystalline structure and further has a rocksalt-type crystalline structure and which is stable at room temperature under atmospheric pressure to a high pressure.

REFERENCES:
patent: 3979271 (1976-09-01), Noreika et al.
patent: 4013533 (1977-03-01), Cohen-Solal et al.
patent: 4057476 (1977-11-01), Krikorian et al.
patent: 4086555 (1978-04-01), Krikorian et al.
Jamieson, J. C., "Crystal Structures at High Pressures . . .", Science, vol. 139, Mar 1, 1963, pp. 845-847.
Shimomura et al., "Pressure Induced . . . ImSb", Philosophical Mag., vol. 34, No. 5, 1976, pp. 839-849.
Asaumi et al., "Pressure-Induced Structural . . . ImSb", J. Physical Soc., Japan, vol. 41, No. 5, Nov. 1976, pp. 1630-1635.
Jayaraman et al., "Melting and Polymorphism . . . Diamond . . . Structure", Physical Rev., vol. 130, No. 2, Apr. 15, 1963, pp. 540-547.
Russel et al., "Structure . . . Properties . . . GaAs Films . . . ", 12th IEEE Photovoltaic Specialists Conf. (Abstract) 1976.
Ueda, R., "Synthesis . . . of CdTe . . . Neutral and Ionized Beams", J. Crystal Growth, vol. 31, 1975, pp. 333-338.
Szczyrbowski et al., "D.C. Sputtering of Thin Indium Arsenide Films", Thin Solid Films, vol. 42, 1977, pp. 193-200.
Ogawa et al., "Deposition of . . . Nb Films by Tetrode Sputtering", J. Vacuum Sci. & Tech., vol. 8, No. 1, pp. 192-194.

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