Metallic implant and process for treating a metallic implant

Etching a substrate: processes – Nongaseous phase etching of substrate – Etching inorganic substrate

Reexamination Certificate

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C216S100000, C623S023550

Reexamination Certificate

active

07048870

ABSTRACT:
A process for treating a metallic implant consisting essentially of treating the metallic implant with a solution of hydrofluoric acid, which solution has a pH between 1.6 and 3.0.

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