Etching a substrate: processes – Nongaseous phase etching of substrate – Etching inorganic substrate
Reexamination Certificate
2006-05-23
2006-05-23
Hassanzadeh, Parviz (Department: 1763)
Etching a substrate: processes
Nongaseous phase etching of substrate
Etching inorganic substrate
C216S100000, C623S023550
Reexamination Certificate
active
07048870
ABSTRACT:
A process for treating a metallic implant consisting essentially of treating the metallic implant with a solution of hydrofluoric acid, which solution has a pH between 1.6 and 3.0.
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Ellingsen Jan Eirik
Rölla Gunnar
AstraZeneca AB
Culbert Roberts
Fish & Richardson P.C.
Hassanzadeh Parviz
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