Metal semiconductor field effect transistors (MESFETS)...

Active solid-state devices (e.g. – transistors – solid-state diode – Heterojunction device – Field effect transistor

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C438S172000, C257SE29140

Reexamination Certificate

active

07402844

ABSTRACT:
A unit cell of a metal-semiconductor field-effect transistor (MESFET) is provided. The unit cell includes a MESFET having a source, a drain and a gate. The gate is between the source and the drain and on a channel layer of the MESFET. The channel layer has a first thickness on a source side of the channel layer and a second thickness, thicker than the first thickness, on a drain side of the channel layer. Related methods of fabricating MESFETs are also provided herein.

REFERENCES:
patent: 3903592 (1975-09-01), Heckl
patent: 4732871 (1988-03-01), Buchmann et al.
patent: 4737469 (1988-04-01), Stevens
patent: 4757028 (1988-07-01), Kondoh et al.
patent: 4762806 (1988-08-01), Suzuki et al.
patent: 4803526 (1989-02-01), Terada et al.
patent: 4897710 (1990-01-01), Suzuki et al.
patent: 4947218 (1990-08-01), Edmond et al.
patent: 5229625 (1993-07-01), Suzuki et al.
patent: 5264713 (1993-11-01), Palmour
patent: 5270554 (1993-12-01), Palmour
patent: 5289015 (1994-02-01), Chirovsky et al.
patent: 5300795 (1994-04-01), Saunier et al.
patent: 5306650 (1994-04-01), O'Mara, Jr. et al.
patent: 5396085 (1995-03-01), Baliga
patent: 5399883 (1995-03-01), Baliga
patent: 5510630 (1996-04-01), Agarwal et al.
patent: 5686737 (1997-11-01), Allen
patent: 5719409 (1998-02-01), Singh et al.
patent: 5742082 (1998-04-01), Tehrani et al.
patent: 5821576 (1998-10-01), Sriram
patent: 5869856 (1999-02-01), Kasahara
patent: 5891769 (1999-04-01), Liaw et al.
patent: 5895939 (1999-04-01), Ueno
patent: 5900648 (1999-05-01), Harris et al.
patent: 5925895 (1999-07-01), Sriram et al.
patent: 5972801 (1999-10-01), Lipkin et al.
patent: 6107649 (2000-08-01), Zhao
patent: 6121633 (2000-09-01), Singh et al.
patent: 6218680 (2001-04-01), Carter, Jr. et al.
patent: 6316793 (2001-11-01), Sheppard et al.
patent: 6686616 (2004-02-01), Allen et al.
patent: 6906350 (2005-06-01), Sriram
patent: 6956239 (2005-10-01), Sriram
patent: 2003/0017660 (2003-01-01), Li
patent: 2004/0099888 (2004-05-01), Sriram
patent: 195 28 604 (1996-09-01), None
patent: 19900169 (1999-07-01), None
patent: 0 518 683 (1992-12-01), None
patent: 0 523 593 (1993-01-01), None
patent: 47-5124 (1972-03-01), None
patent: 54155482 (1979-12-01), None
patent: 59134874 (1984-08-01), None
patent: 60142568 (1985-07-01), None
patent: 60154674 (1985-08-01), None
patent: 60189250 (1985-09-01), None
patent: 63047983 (1988-02-01), None
patent: 63-263771 (1988-10-01), None
patent: 64-081274 (1989-03-01), None
patent: 01059961 (1989-03-01), None
patent: 1106476 (1989-04-01), None
patent: 1106477 (1989-04-01), None
patent: 1196873 (1989-08-01), None
patent: 1308876 (1989-12-01), None
patent: 02010772 (1990-01-01), None
patent: 04225534 (1992-08-01), None
patent: 09036359 (1997-02-01), None
patent: 11150124 (1999-06-01), None
patent: WO 98/19342 (1998-05-01), None
patent: WO 98/20563 (1998-05-01), None
patent: WO 01/67521 (2001-09-01), None
patent: WO 01/86727 (2001-11-01), None
patent: WO2005114749 (2005-12-01), None
U.S. Appl. No. 10/977,054, filed Oct. 29, 2004, Sriram et al.
U.S. Appl. No. 10/977,227, filed Oct. 29, 2004, Sriram et al.
U.S. Appl. No. 11/012,553, filed Dec. 15, 2004, Sriram.
U.S. Appl. No. 11/157,356, filed Jun. 21, 2005, Sriram.
A 10 W 2 GHz Silicon Carbide MESFET,Microwave Journal, Sep. 1999, pp. 232, 240, 242.
Allen,Silicon Carbide MESFET's with 2W/mm and 50% P.A.E. at 1.8 GHz, 1996.
Browne, Editorial:The Power and the Glory, Microwaves & RF, Jul. 1999, p. 17.
Browne,SiC MESFET Delivers 10-W Power at 2GHZ, Microwaves & RF, Oct. 1999, pp. 138-139.
Browne,Top Products of 1999, Microwaves & RF, Dec. 1999, pp. 223-233.
Carter et al.,Silicon Carbide and Related Materials, 1999, Part 2, Materials Science Forum, vols. 338-342, pp. 1247-1266 (2000).
Evwaraye et al., “Examination of Electrical and Optical Properties of Vanadium in Bulk n-Type Silicon Carbide,”J. Appl. Phys.vol. 76, No. 10, 1994.
First Silicon Carbide Microwave Power Products Are Introduced,Applied Microwave & Wireless, pp. 104.
Heftman,Wireless Semi Technology Heads Into New Territory,Microwaves & RF, Feb. 2000, pp. 31-38.
Hilton et al.,Suppression of Instabilities in 4H-SiC Microwave MESFETs,2000 8thIEEE International Symposium.
Hilton et al.,Surface Induced Instabilities in 4H-SiC Microwave MESFETs, Materials Science Forum, vols. 338-342, 2000, pp. 1251-1254.
Jonsson et al.,Physical Simulations on the Operations of 4H-SiC Microwave Power Transistors,Materials Science Forum, vols. 338-342, 2000, pp. 1263-1266.
Kelner et al.,β-SiC MESFET's and Buried-Gate JFET's, IEEE Electron Device Letters, vol. EDL-8, No. 9, Sep. 1987, pp. 428-430.
Kong et al.,Temperature Dependence of the Current-Voltage Characteristics of Metal-Semiconductor Field-Effect Transistors in n-Type β -SiC Grown Via Chemical Vapor Deposition,Appl. Phys Lett., vol. 51, No. 6, Aug. 10, 1987, pp. 442-444.
Konstantinov et al., High Performance Silicon Carbide MESFET Utilizing Lateral Epitaxy,Materials Science Forum,vols. 389-393, pp. 1375-1378.
Konstantinov et al.,Investigation of Lo-Hi-Lo and Delta-Doped Silicon Carbide Structures,Mat. Res. Soc. Symp. Proc., vol. 640, 2001, pp. H2.4.1-H2.4.6.
Long, Wei et al., “Dual-Material Gate (DMG) Field Effect Transistor,”IEEE Trans. Electron Dev., vol. 46, No. 5, pp. 865-879 (May 1999).
Ma, et al.,High Efficiency LDMOS Power FET for Low Voltage Wireless Communications,1996 IEEE.
Nilsson et al.,Characterization of SiC MESFETs on Conducting Substrates,Materials Science Forum, vols. 338-342, 2000, pp. 1255-1258.
Noblanc et al.,Power Density Comparison Between Microwave Power MESFET's Processed on Conductive and Semi-Insulating Wafer,Materials Science Forum, vols. 338-342, 2000, pp. 1247-1250.
Palmour et al.,Characterization of Device Parameters in High-Temperature Metal-Oxide-Semiconductor Field Effect Transistors in β SiC Thin Films,J. Appl. Phys, vol. 64, No. 4, Aug. 15, 1988, pp. 2168-2177.
Palmour et al.,High-Temperature Depletion-Mode Metal-Oxide-Semiconductor Field Effect Transistors in Beta-SiC Thin Films,Appl. Phys. Lett., vol. 51, No. 24, Dec. 14, 1987, pp. 2028-2030.
Palmour et al.,Ultrafast Silicon-Carbide Rectifiers,Powertechnics Magazine, Aug. 1989, pp. 18-21.
Rorsman et al.,Fabrication, Characterization and Modeling of SiC MESFETs,Materials Science Forum, vols. 338-342, 2000, pp. 12-59-1262.
Rotella, F.M. et al., “Modeling, Analysis, and Design of RF LDMOS Devices Using Harmonic-Balance Device Simulation,”IEEE Trans. Microwave Theor. Tech.,vol. 48, No. 6, pp. 991-999 (Jun. 2000).
Shur, Michael, “Split-gate Field-Effect Transistor,”Appl. Phys. Lett.,vol. 54, No. 2, pp. 162-164 (Jan. 9, 1989).
SiC MESFET Drives PCS Base Stations,Wireless Systems Design, Oct. 1999, pp. 24.
Soares, ed.,GaAs MESFET Circuit Design,Artech House, 1988, pp. 7-9, 17-18.
Sze,Physics of Semiconductor Devices, Second Edition,John Wiley & Sons, 1981, pp. 341-347.
Xiong, Zhibin et al., “P-6: A Novel Self-Aligned Lightly-Doped-Drain Polysilicon Thin-Film Transistor Using a Partial Exposure Technique,” SID 04 Digest, pp. 240-243.
Yokogawa et al.,Electronic Properties of Nitrogen Delta-Doped Silicon Carbide Layers,Mat. Res. Soc. Symp. Proc., vol. 640, 2001, pp. H2.5.1-H2.5.6.
International Search Report and Written Opinion of the International Searching Authority, corresponding to PCT/uS2006/004139, mailed Mar. 26, 2007.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Metal semiconductor field effect transistors (MESFETS)... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Metal semiconductor field effect transistors (MESFETS)..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Metal semiconductor field effect transistors (MESFETS)... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2813903

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.