Patent
1981-11-25
1984-01-10
Clawson, Jr., Joseph E.
357 15, 357 55, 357 91, H01L 2980
Patent
active
044255730
ABSTRACT:
A MESFET is disclosed wherein a gallium arsenide semiconductor material is doped. The doping magnitude differs in the source area, drain area, and in the gate area. An increase of the dielectric strength without an increase of parasitic resistances is provided. In the manufacture of the MESFET, shadowing techniques are employed to vary the doping magnitudes.
REFERENCES:
patent: 4002927 (1977-01-01), Nakamura et al.
patent: 4037169 (1977-07-01), Suzuki
patent: 4173764 (1979-11-01), DeCremoux
patent: 4212022 (1980-07-01), Beneking
patent: 4337473 (1982-06-01), Nishizawa
Clawson Jr. Joseph E.
Siemens Aktiengesellschaft
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