Metal redistribution by rapid thermal processing

Details Metal redistribution by rapid thermal processing Metal redistribution by rapid thermal processing

1985-12-23

1988-01-05

Silverberg, Sam

Coating processes

Electrical product produced

Welding electrode

148DIG37, 148DIG62, B05D 314

Patent

active

047175885

ABSTRACT:
A method for diffusing a metal dopant into a semiconductor switching device is provided by the use of a rapid thermal heating apparatus. This method provides a procedure for the selectively placing of a metal dopant in a region of the device or circuit. This aids in increasing the manufacturing yields of the switching device, and increases the number of active traps for minority carriers.

REFERENCES:
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patent: 3445736 (1969-05-01), Navon
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patent: 4503087 (1985-03-01), Russo
D. F. Downey, C. J. Russo, J. T. White, "Activation and Process Characteristics of Infrared Rapid Isothermal and Furnace Annealing Techniques", Solid State Technology, Sep. 1982, pp. 87-93.

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