Metal oxide films

Details Metal oxide films Metal oxide films

1971-05-18

1977-12-27

Vertiz, O. R.

Stock material or miscellaneous articles

Composite

Of quartz or glass

204192P, 428539, C01C 1500

Patent

active

040656004

ABSTRACT:
In a method of depositing a transparent electrically conductive metal oxide coating by reactive sputtering onto the surface of a substrate, the substrate is supported, in spaced relationship with a cathode which is to be sputtered, in a vacuum chamber containing an atmosphere comprising an inert gas and a controlled oxygen concentration at a selected total pressure. The substrate is heated prior to sputtering to a selected elevated temperature, and reactive sputtering is caused by applying a selected negative potential relative to the substrate. The oxygen in the atmosphere is provided and maintained at a selected concentration, and the heating of said substrate is controlled during sputtering to maintain the substrate temperature substantially constant at the selected temperature during substrate heating caused by sputtering. The selected values of the oxygen concentration substrate temperature, vacuum chamber pressure, and cathode potential are so chosen that the deposited coating is haze-free, and its specific electrical resistivity lies at or close to the minimum of the curve which is obtained by plotting specific electrical resistivity against oxygen concentration while maintaining the substrate temperature, vacuum chamber pressure and cathode potential all constant at the selected values. Glass articles with stable, transparent and haze-free coatings having acceptable resistance are produced by the method.

REFERENCES:
patent: 3531335 (1970-09-01), Heyerdahl et al.
patent: 3630873 (1971-12-01), Moore et al.
patent: 3655545 (1972-04-01), Gillery et al.
patent: 3907660 (1975-09-01), Gillery

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