Metal mask for light intensity determination and ADC...

Details Metal mask for light intensity determination and ADC... Metal mask for light intensity determination and ADC...

2008-01-29

2008-01-29

Mariam, Daniel (Department: 2624)

Image analysis

Pattern recognition

Reexamination Certificate

active

10653971

ABSTRACT:
An apparatus and method for controlling gain characteristics in a CMOS imager and for calibrating light intensity and analog to digital conversion in a pixel array. A mask with varying sized apertures is provided over pixels of an array outside the active area for use in intensity adjustments and calibration.

REFERENCES:
patent: 4408231 (1983-10-01), Bushaw et al.
patent: 5489994 (1996-02-01), Torok et al.
patent: 5833507 (1998-11-01), Woodgate et al.
patent: 6057586 (2000-05-01), Bawolek et al.
patent: 6124920 (2000-09-01), Moseley et al.
patent: 6235549 (2001-05-01), Bawolek et al.
patent: 6272207 (2001-08-01), Tang
patent: 6278169 (2001-08-01), Sayuk et al.
patent: 6529239 (2003-03-01), Dyck et al.
patent: 6667769 (2003-12-01), Harton et al.
patent: 6872895 (2005-03-01), Cochran et al.
patent: 6958768 (2005-10-01), Rao et al.
patent: 2005/0030413 (2005-02-01), Gough

Affiliated with

Also associated with

Rating

Metal mask for light intensity determination and ADC... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Metal mask for light intensity determination and ADC..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Metal mask for light intensity determination and ADC... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3904566