Metal laminate and etching method therefor

Stock material or miscellaneous articles – Composite – Of metal

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C428S336000, C428S681000, C216S013000, C216S016000, C216S067000, C216S083000, C360S128000, C360S245900

Reexamination Certificate

active

10500846

ABSTRACT:
The present invention relates to a metal laminate which is broadly used for a flexible wiring board or the like and an etching method therefor. In particular, the present invention relates to a metal laminate which includes a layer obtained by laminating a metal layer and an insulating layer, where the insulating layer is subjected to an etching process, wherein, in a surface of the metal layer which is positioned so as to come in contact with the insulating layer, respective concentrations of main metal element and oxygen element constituting the metal layer are measured from the surface of the metal layer towards inside of the metal layer in a time-elapsing manner according to AES (Auger electron spectroscopy) and a value of the thickness of a metal oxide film of the surface of the metal layer measured at a time when atomic concentrations of the main metal element and the oxygen element constituting the metal layer become equal to each other is in a range of at least 0 Å to less than 50 Å.According to the present invention, an etching time of polyimide in the polyimide metal laminate can be calculated and a flexure used for a suspension for a hard disc drive having a high productivity can be provided.

REFERENCES:
patent: 5401382 (1995-03-01), Katsuma
patent: 2002/0027127 (2002-03-01), Yagi et al.
patent: 2002/0155710 (2002-10-01), Okamura et al.
patent: 2003/0085451 (2003-05-01), Sakayori et al.
patent: 2004/0067349 (2004-04-01), Okamura et al.
patent: 2004/0096676 (2004-05-01), Sakayori et al.
patent: 2001-055570 (2001-02-01), None
patent: 2002-25027 (2002-01-01), None
patent: 2002-240193 (2002-08-01), None
patent: 2002-240194 (2002-08-01), None
patent: 2002-245609 (2002-08-01), None
patent: 2002-246708 (2002-08-01), None
patent: 2002-246708 (2002-08-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Metal laminate and etching method therefor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Metal laminate and etching method therefor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Metal laminate and etching method therefor will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3743676

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.