Metal ion reduction in novolak resins and photoresists

Details Metal ion reduction in novolak resins and photoresists Metal ion reduction in novolak resins and photoresists

1994-07-11

1997-01-14

Acquah, Samuel A.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Treating polymer containing material or treating a solid...

528129, 528142, 528143, 528147, 528486, 528487, 528488, 528489, 528499, 430190, C08F 600, G03C 152

Patent

active

055940986

ABSTRACT:
The present invention provides methods for producing water insoluble, aqueous alkali soluble novolak resins having a very low level of metal ions, utilizing treated ion exchange resins. A method is also provided for producing photoresist composition having a very low level of metal ions from such novolak resins and for producing semiconductor devices using such photoresist compositions.

REFERENCES:
patent: 2929808 (1956-04-01), Ross et al.
patent: 4033909 (1977-07-01), Papa
patent: 4033910 (1977-07-01), Papa
patent: 4636540 (1987-01-01), Warfel
patent: 4747954 (1988-05-01), Vaughn et al.
patent: 4784937 (1988-11-01), Tanaka et al.
patent: 4833067 (1989-05-01), Tanaka et al.
patent: 4914006 (1990-04-01), Kato et al.
patent: 5073622 (1991-12-01), Wojtech et al.
patent: 5116715 (1992-05-01), Roland
patent: 5118787 (1992-06-01), Furuno
patent: 5175078 (1992-12-01), Aoyama et al.
patent: 5286606 (1994-12-01), Rahman et al.
Amberlite Ion Exchange Resins Laboratory Guide, Rohm and Haas Company, Philadelphia, PA, USA, Sep. 1979.
Journal of the Electrochemical Society, vol. 137, No. 12, Dec. 1990, Manchester, New Hampshire, pp. 393900-3905, T. Tanaka, "A New Photolithography Technique with Anti reflective Costing on Resist or ARCOR".
Bayard; "Water Free of Heavy Metals for Medical Use and Ion Exchange Resin Used in its Preparation"; Nov. 16, 1992; CA98(26).221589z.
Hirai et al; "Treatment of Waste Waters Containing Formaldehyde and Metals with Chelating Ion Exchange Resins"; Nov. 5, 1975; CA84(14):95328j.
Kimura et al; "Purification of Formaldehyde"; Mar. 9, 1977; CA87(7):52776y.
Journal of the Electrochemical Society, vol. 137, No. 12, Dec. 1990, Manchester, New Hampshire US, pp. 393900-3905, XP0001681, T. Tanada "A New Photolithography Tech. w/Antireflective . . . ".
Derwent Publ. Ltd., London, GB; & JP-A-4065415 (Hitachi Chemical) Feb. 3, 1992.
Derwent Publ. Ltd., London, GB; & JP-A-1228560 (Hitachi) Dec. 9, 1989.
Chemical Abstracts, vol. 112, No. 18, Apr. 30, 1990, Columbus, OH, p. 17, the Abstract 159201u, JP-A-1190713 (Inatomi, Shigeki et al) Jul. 31, 1989.

Affiliated with

Also associated with

Rating

Metal ion reduction in novolak resins and photoresists does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Metal ion reduction in novolak resins and photoresists, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Metal ion reduction in novolak resins and photoresists will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1389158