Metal ion reduction in novolak resin solution using an anion exc

Details Metal ion reduction in novolak resin solution using an anion exc Metal ion reduction in novolak resin solution using an anion exc

1994-08-23

1997-11-11

Acquah, Samuel A.

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Treating polymer containing material or treating a solid...

528489, 528493, 528499, 528502, C08F 600, C08G 278, C08J 300

Patent

active

056865619

ABSTRACT:
The present invention provides methods for producing water insoluble, aqueous alkali soluble novolak resins having a very low level of metal ions, utilizing a specially treated anion exchange resin. A method is also provided for producing photoresist composition having a very low level of metal ions from such novolak resins and for producing semiconductor devices using such photoresist compositions.

REFERENCES:
patent: 4033909 (1977-07-01), Papa
patent: 4636540 (1987-01-01), Warfel
patent: 5073622 (1991-12-01), Wojtech et al.

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