Chemistry: electrical and wave energy – Apparatus – Vacuum arc discharge coating
Patent
1989-12-11
1991-02-19
Nguyen, Nam X.
Chemistry: electrical and wave energy
Apparatus
Vacuum arc discharge coating
20419238, C23C 1448
Patent
active
049941640
ABSTRACT:
A metallurgic implantation apparatus of metal ions having a large emitting surface, a considerable flux and a controllable implantation depth comprises within an implantation chamber held in vacuo at least one vacuum arc ion source (1, 2, 3, 4) from which the ions (5) are extracted and projected onto a target plate (9) by means of an extraction and focusing electrode (6,7) and of an acceleration electrode (8) polarized at a very high and at a low voltage, respectively. The target plate (9) bombarded by the projection of ions emits a flux of secondary electrons, which are repelled by a suppression electrode (10) polarized negatively with respect to the target plate connected to ground.
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Bernardet Henri
Thiebaut Chantal
Miller Paul R.
Nguyen Nam X.
U.S. Philips Corporation
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