Metal growth accelerator shell for the chemical vaporization dep

Coating apparatus – Gas or vapor deposition

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118724, 118725, 156DIG68, H01L 2100

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active

053063481

ABSTRACT:
The rate at which diamond is deposited by chemical vapor deposition on a substrate is increased by the presence of an expediting metal such as molybdenum in the surface of a wall exposed to the chemical vapor deposition.

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"Handbook of Chemistry and Physics"; 61st ed. CRC Press; .COPYRGT.1981; Weast et al.; pp. E-12 to E-14.
Singh et al., Applied Physics Letters, 52, 451-452 (1988).

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