Coating apparatus – Gas or vapor deposition
Patent
1992-06-03
1994-04-26
Hearn, Brian E.
Coating apparatus
Gas or vapor deposition
118724, 118725, 156DIG68, H01L 2100
Patent
active
053063481
ABSTRACT:
The rate at which diamond is deposited by chemical vapor deposition on a substrate is increased by the presence of an expediting metal such as molybdenum in the surface of a wall exposed to the chemical vapor deposition.
REFERENCES:
patent: 4347431 (1982-08-01), Pearce et al.
patent: 4425315 (1984-01-01), Tsuji et al.
patent: 4707384 (1987-11-01), Schachner et al.
patent: 4953499 (1990-09-01), Anthony et al.
patent: 4958592 (1990-09-01), Anthony et al.
patent: 4982693 (1991-01-01), Ebato
patent: 4989543 (1991-02-01), Schmitt
"Handbook of Chemistry and Physics"; 61st ed. CRC Press; .COPYRGT.1981; Weast et al.; pp. E-12 to E-14.
Singh et al., Applied Physics Letters, 52, 451-452 (1988).
Anthony Thomas R.
Fleischer James F.
General Electric Company
Goudreau George
Hearn Brian E.
Pittman William H.
LandOfFree
Metal growth accelerator shell for the chemical vaporization dep does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Metal growth accelerator shell for the chemical vaporization dep, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Metal growth accelerator shell for the chemical vaporization dep will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1709613