Coating apparatus – Gas or vapor deposition – Work support
Patent
1993-09-01
1995-09-19
Breneman, R. Bruce
Coating apparatus
Gas or vapor deposition
Work support
118720, 118721, C23C 1600
Patent
active
054512611
ABSTRACT:
On a semiconductor substrate, chips to be products and alignment chips located at a portion a part thereof is left out from a peripheral part of the semiconductor substrate are formed. Contact holes and alignment marks are formed at the chips to be products and the alignment chips. Covering the alignment chips with alignment mark cover parts of a substrate holder, a material for metal wiring is deposited on the semiconductor substrate to form a metal film on the substrate. A mask pattern is formed on the metal film using the alignment marks of the alignment chips on which the metal film is not formed.
REFERENCES:
patent: 4599970 (1986-07-01), Peterson
patent: 4661228 (1987-04-01), Mintz
patent: 4919076 (1990-04-01), Lutz
patent: 4963423 (1990-10-01), Sekiguchi
Fujii Toyokazu
Hashimoto Kazuhiko
Nishio Mikio
Sekiguchi Mitsuru
Breneman R. Bruce
Chang Joni Y.
Matsushita Electric - Industrial Co., Ltd.
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