Metal filled through via structure for providing vertical...

Active solid-state devices (e.g. – transistors – solid-state diode – Housing or package – With contact or lead

Reexamination Certificate

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C257S621000, C257S686000, C257S774000, C257S777000

Reexamination Certificate

active

07821120

ABSTRACT:
A vertical wafer-to-wafer interconnect structure is provided in which a first wafer and a second wafer are mated by way of metal studs that extend from a surface of the first wafer. The metal studs extend from the surface of the first wafer into a corresponding through via of the second wafer. A polyimide coating is present in the through via on mated surfaces of the first and second wafers and on another surface of the second wafer not mated to the first wafer, thus the metal studs provide a continuous metal path from the first wafer through the second wafer. Since only metal studs for the vertical connection are used, no alpha radiation is generated by the metal studs.

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EP Official Action—Application No. 07853503.6—Jul. 28, 2009.

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