Metal etch rate analyzer

Details Metal etch rate analyzer Metal etch rate analyzer

1978-12-29

1981-04-07

Church, Craig E.

Optics: measuring and testing

By dispersed light spectroscopy

Utilizing a spectrometer

G01B 902

Patent

active

042602599

ABSTRACT:
An improved interferometer system for detecting the etch rate of an opaque material, such as silicon or metal. The system includes means for producing two parallel beams of light, with one beam being directed to the surface of the opaque material, and the other beam being directed to the surface of an adjacent masking material of transparent nature. The rate of etch of the opaque material is detected from the interference pattern changes between the first beam and the second beam. The system utilizes a novel arrangement of beam splitters which results in equal path lengths for the respective beams and further includes a viewing light which is passed by a system of dichroic filters to enable observation of the focus spot.

REFERENCES:
patent: 3612692 (1971-10-01), Kruppa
patent: 4147435 (1979-04-01), Habegger

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