Metal complex source reagents for chemical vapor deposition

Organic compounds -- part of the class 532-570 series – Organic compounds – Heterocyclic carbon compounds containing a hetero ring...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

556 40, 556 42, 556 57, 556136, 549 3, 549206, 505100, 505124, 546257, C07F 900, C07F 1100, C07F 1500, C07D21322

Patent

active

058408975

ABSTRACT:
A metalorganic complex of the formula:

REFERENCES:
patent: 3410710 (1968-11-01), Mochel
patent: 4129434 (1978-12-01), Plumat et al.
patent: 4180386 (1979-12-01), McCormack et al.
patent: 4501602 (1985-02-01), Miller et al.
patent: 5139999 (1992-08-01), Gordon et al.
patent: 5171847 (1992-12-01), Smith et al.
patent: 5225561 (1993-07-01), Kirlin et al.
patent: 5248787 (1993-09-01), Timmer et al.
patent: 5412129 (1995-05-01), DiCarolis
patent: 5453494 (1995-09-01), Kirlin et al.
Wei et al., Acta Cryst. C43 , 1076-80 (1987), "Oligoether Complexes of Alkaline-Earth Metal Ions.".
Pajerski et al., J. Am. Chem. Soc. 110, 4844-5 (1988), "X-Ray Structures of Threaded Et.sub.2 Mg (18-crown-6) and Et.sub.2 Zn (18-crown-6)".
Van des Sluis et al., Act. Cryst. C 46, 1741-3 (1990), "Structure of Bis (1,1,1,5,5,5,-hexa fluoro-2,4-pentanedionato()2,5,8,11,14-pentaoxapentadecane) barium (II)".
Rakita et al., J. Inorg. Nucl. Chem. 30, 2139-45 (1968), "Base Adduct Interactions with Nickel (II) and Copper (II) .beta.-Ketoenolates".
Pradilla-Sorzano et al., Inorg. Chem. 12, 1174-83 (1973), "Base Adducts of .beta.-Ketoenolates".
Weber et al., Acta. Cryst. C 40, 1570-2 (1984), "2,5,8,11,14,17,20-Heptaoxahenicoane-Barium Isothiocyanate".

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Metal complex source reagents for chemical vapor deposition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Metal complex source reagents for chemical vapor deposition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Metal complex source reagents for chemical vapor deposition will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1703806

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.