Metal coated nanocrystalline silicon as an active surface...

Details Metal coated nanocrystalline silicon as an active surface... Metal coated nanocrystalline silicon as an active surface...

2008-07-15

2008-07-15

Geisel, Kara (Department: 2877)

Optics: measuring and testing

Sample, specimen, or standard holder or support

C356S301000

Reexamination Certificate

active

11264433

ABSTRACT:
The disclosed methods and apparatus concern Raman spectroscopy using metal coated nanocrystalline porous silicon substrates. Porous silicon substrates may be formed by anodic etching in dilute hydrofluoric acid. A thin coating of a Raman active metal, such as gold or silver, may be coated onto the porous silicon by cathodic electromigration or any known technique. In certain alternatives, the metal coated porous silicon substrate comprises a plasma-oxidized, dip and decomposed porous silicon substrate. The metal-coated substrate provides an extensive, metal rich environment for SERS, SERRS, hyper-Raman and/or CARS Raman spectroscopy. In certain alternatives, metal nanoparticles may be added to the metal-coated substrate to further enhance the Raman signals. Raman spectroscopy may be used to detect, identify and/or quantify a wide variety of analytes, using the disclosed methods and apparatus. In some disclosed methods, Raman spectroscopy may be used to detect nucleotides, purines or pyrimidines at the single molecule level.

REFERENCES:
patent: 5255067 (1993-10-01), Carrabba et al.
patent: 5561304 (1996-10-01), Canham et al.
patent: 5567628 (1996-10-01), Tarcha et al.
patent: 6399177 (2002-06-01), Fonash et al.
patent: 6504292 (2003-01-01), Choi et al.
patent: 6623977 (2003-09-01), Farquharson et al.
patent: 6972173 (2005-12-01), Su et al.
patent: 6989897 (2006-01-01), Chan et al.
patent: 7192703 (2007-03-01), Sun et al.
patent: 7238477 (2007-07-01), Su et al.
patent: 7267948 (2007-09-01), Vo-Dinh
patent: 2002/0020053 (2002-02-01), Fonash et al.
patent: 2002/0142480 (2002-10-01), Natan
patent: 0984269 (2000-03-01), None
patent: 590479 (1947-07-01), None
patent: 2 373 367 (2002-09-01), None
patent: WO 00/08445 (2000-02-01), None
patent: WO-00/08445 (2000-02-01), None
patent: 03/106943 (2003-12-01), None
Canham, “Silicon quantum wire array fabrication by electrochemical and chemical dissolution of wafers,” Appl. Phys. Lett. 57:1046, 1990.
Collins et al., Physics Today 50:24-31, 1997.
Cullis et al., J. Appl. Phys. 82:909-965, 1997.
Edelberg, et al., “Visible luminescence from nanocrystalline silicono films produced by plasma enhanced chemical vapor deposition,” Appl. Phys. Lett., 68:1415-1417, 1996.
Feldheim, “Assembly of metal nanoparticle arrays using molecular bridges,” The Electrochemical Society Interface, Fall, 2001, pp. 22-25.
Gole et al., “Patterned metallization of porous silicon from electroless solution for direct electriceal contact,” J. Electrochem. Soc. 147:3758, 2000.
Henneke, “Porous Silicon: theories behind light emission,” 1996, 1-4. Retrieved from the Internet URL: <http:/
eon.utexas.edu/academic/courses/Fall1997/CH380L/student.papers/dh.html>.
Jin et al., “Photoinduced conversion of silver nanospheres to nanoprisms,”Science294:1901, 2001.
Lopez and Fauchet, “Erbium emission form porous silicon one-dimensional photonic band gap structures,” Appl. Phys. Lett. 77:3704-6, 2000.
Lutzen et al., Structural characteristics of ultrathin nanocrystalline silicon films formed by annealing amorphous silicon, J. Vac. Sci. Technology B 16:2802-05, 1998.
Petrova-Koch et al., “Rapid-thermal-oxidized porous silicon—the superior photoluminescent Si,” Appl. Phys. Lett. 61:943, 1992.
Gole, J.L. et al., “Patterned Metallization of Porous Silicon from Electroless Solution for Direct Electrical Contact”,Journ. Of The Electrochemical Society, 147 (10) 3785-3789 (2000).
Parbokov et al., “The production of a novel stain-etched porous silicon, metallization of the porous surface and application in hydrocarbon sensors”,Materials Science and Engineering, C15:121-123 (2001).
Vo-Dinh, T., “Surface-enhanced Raman Spectroscopy using metallic nanostructures”,Trends in Analytical Chemistry, vol. 17, Nos. 8-9, (1998).
Unal, B. et al., “Photovoltaic properties of a novel stain etched porous silicon and its application in photosensitive devices”,Optical Materials,17;79-82 (2001).

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