Abrading – Abrading process – Glass or stone abrading
Reexamination Certificate
2005-10-11
2005-10-11
Baumeister, B. William (Department: 2891)
Abrading
Abrading process
Glass or stone abrading
C451S036000, C451S028000, C438S692000, C438S693000, C252S079100, C156S345110
Reexamination Certificate
active
06953389
ABSTRACT:
Metal CMP slurry compositions having relatively low chemical etch rate and relatively high mechanical polishing rate characteristics are provided. The relatively high mechanical polishing rate characteristics are achieved using relatively high concentrations of mechanical abrasive (e.g., ≧8 wt %) in combination with sufficient quantities of a wetting agent to inhibit micro-scratching of underlying surfaces (e.g., insulating layers, conductive vias, . . . ) being polished. The slurry compositions also include a highly stable metal-propylenediaminetetraacetate (M-PDTA) complex, which may operate to inhibit metal-oxide re-adhesion on the metal surface being polished and/or inhibit oxidation of the metal surface by chelating with the surface.
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Lee Jae Seok
Lee Kil Sung
Baumeister B. William
Cheil Industries Inc.
Myers Bigel & Sibley & Sajovec
Yevsikov Victor V.
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