Metal attachment method and structure for attaching substrates a

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Chip mounted on chip

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

257778, 257758, 257759, 257760, 257763, 257765, H01L 2348, H01L 2352, H01L 2940

Patent

active

060970960

ABSTRACT:
A high density integrated circuit structure and method of making the same includes providing a first silicon substrate structure having semiconductor device formations in accordance with a first circuit implementation and metal interlevel lines disposed on a top surface thereof and a second silicon substrate structure having a second circuit implementation and metal interlevel lines disposed on a top surface thereof. The first substrate structure includes a planarized low-K dielectric disposed between the metal interlevel lines and a protective coating separating the metal interlevel lines from the low-K dielectric, the metal interlevel lines of the first silicon substrate structure have a melting temperature on the order of less than 500.degree. C. and the low-K dielectric having a dielectric K-value in the range of 2.0-3.8. The second substrate structure also includes a planarized low-K dielectric disposed between the metal interlevel lines and a protective coating separating the metal interlevel lines from the low-K dielectric, the metal interlevel lines having a melting temperature on the order of less than 500.degree. C. and the low-K dielectric having a dielectric K-value in the range of 2.0-3.8. Lastly, the first substrate structure is low temperature bonded to the second substrate structure at respective metal interlevel lines of the first and second substrate structures.

REFERENCES:
patent: 3838442 (1974-09-01), Humphreys
patent: 4596604 (1986-06-01), Akiyama et al.
patent: 4612083 (1986-09-01), Yasumoto et al.
patent: 4818728 (1989-04-01), Rai et al.
patent: 4834809 (1989-05-01), Kakihara
patent: 4902637 (1990-02-01), Kondou et al.
patent: 5426072 (1995-06-01), Finnila
patent: 5710460 (1998-01-01), Leidy et al.
patent: 5780121 (1998-07-01), Endo
patent: 5780874 (1998-07-01), Kudo

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Metal attachment method and structure for attaching substrates a does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Metal attachment method and structure for attaching substrates a, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Metal attachment method and structure for attaching substrates a will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-666821

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.