Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing
Reexamination Certificate
2007-10-15
2011-11-01
Silverman, Stanley (Department: 1736)
Chemistry of inorganic compounds
Silicon or compound thereof
Oxygen containing
C423S335000, C977S773000, C977S775000, C977S776000
Reexamination Certificate
active
08048394
ABSTRACT:
The present invention relates to (1) hollow silica particles including an outer shell portion having a mesoporous structure with an average pore size of from 1 to 10 nm, wherein the silica particles have an average particle diameter of from 0.05 to 10 μm, and 80% or more of the whole silica particles have a particle diameter falling within the range of ±30% of the average particle diameter; (2) composite silica particles including silica particles which include an outer shell portion having a mesoporous structure with an average pore size of from 1 to 10 nm, and have a BET specific surface area of 100 m2/g or more, and a hydrophobic organic compound or a polymeric organic compound incorporated inside of the silica particles; and a process for producing the hollow silica particles.
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Office Action issued on Jan. 30, 2011 in the corresponding Chinese Patent Application No. 200780040531.1 (English Translation only).
Sawada Takuya
Yano Toshihiro
Kao Corporation
Oblon, Spivak McClelland, Maier & Neustadt, L.L.P.
Silverman Stanley
Zimmer Anthony J
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