Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing
Patent
1997-09-09
1999-11-09
Bell, Mark L.
Chemistry of inorganic compounds
Silicon or compound thereof
Oxygen containing
4233282, 423335, 502 81, 502232, C01B 3338, C01B 3344
Patent
active
059808497
ABSTRACT:
Provided is a mesopore material and the manufacturing method thereof characterized by having uniform diameter of each pore as well as a high crystallographic regularity, comprising primary particles having a small axe with uniformity, allowing for synthesizing the primary particles with the size freely controlled, and allowing for simple manufacturing at a reduced cost. The mesopore material comprising: pores having a diameter in a range of 2 to 10 nm; and a primary particle having a major axe in a range of 10 nm to 1 .mu.m. The diameter range is defined at a maximum peak in a pore distribution curve, and 75% or more of the pores is in a diameter range of -40% to +40% of the pore diameter at the maximum peak. Further provided is a laminar silicic acid composed of the uninvertible tetrahedral sheet and has a uniform shape and size. Also provided is a laminar silicic acid salt composed of the uninvertible tetrahedral sheet and has a uniform shape and size. The laminar silicic acid comprising a laminar silicon dioxide having a laminar six-membered ring skeleton and having a crystallographic regularity. A skeleton of a clay mineral having a 1:1 laminar structure or a 2:1 laminar structure consisting of an uninvertible tetrahedral sheet of a silicon dioxide and an octahedral sheet of an oxide of a metal remains in the laminar silicic acid. Acid acts on the clay mineral to form the laminar silicic acid.
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Fukushima Yoshiaki
Inagaki Shinji
Ogata Shin-ichi
Bell Mark L.
Kabushiki Kaisha Toyota Chuo Kenkyusho
Sample David
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