Chemistry of inorganic compounds – Silicon or compound thereof – Oxygen containing
Patent
1998-03-31
1999-09-21
Bell, Mark L.
Chemistry of inorganic compounds
Silicon or compound thereof
Oxygen containing
4233281, 4233282, 423331, 423332, 423335, 502 60, 502 80, 502 82, 502 83, C01B 3338, C01B 3344
Patent
active
059550490
ABSTRACT:
A silicon dioxide tetrahedron sheet having a specific morphology with the pseudomorphs of the starting raw material of clay minerals for the sheet is prepared, and this is reacted with an alkylonium salt whereby a desired number of the silicon dioxide tetrahedrons are removed from the sheet by the action of the micelles of the alkylonium salt formed on the surface of the sheet to thereby form mesopores in the sheet. The mesopore material of the sheet has phyllo-structured 6-membered skeletons as connected to each other, in which each one phyllo-structured 6-membered skeleton is formed by connecting 6 silicon dioxide tetrahedrons together, and its mesopores are formed by removing a desired number of the silicon dioxide tetrahedrons from the sheet.
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I.A. Aksay, et al., "Biomimetic Pathways for Assembling Inorganic Thin Films", Science, vol. 273, Aug. 16, 1996, pp. 892-898.
Kiyoshi Okada, et al., "New Preparation Method for Mesoporous .gamma.-Alumina by Selective Leaching Of Calcined Kaolin Minerals", J. Mater. Chem., 1995, vol. 5, No. 8. pp. 1241-1244 (No Month).
Fukushima Yoshiaki
Ogata Shin-ichi
Bell Mark L.
Kabushiki Kaisha Toyota Chuo Kenkyusho
Sample David
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