Active solid-state devices (e.g. – transistors – solid-state diode – Heterojunction device – Field effect transistor
Patent
1991-01-31
1994-02-01
Larkins, William D.
Active solid-state devices (e.g., transistors, solid-state diode
Heterojunction device
Field effect transistor
257192, 257198, 257201, H01L 29812, H01L 2973
Patent
active
052834484
ABSTRACT:
A GaAs MESFET employs an etch stop layer of Ga.sub.0.99 In.sub.0.01 As over the channel region.
REFERENCES:
patent: 4590502 (1986-05-01), Morkou
patent: 4652896 (1987-03-01), Das et al.
patent: 4742379 (1988-05-01), Yamashita et al.
patent: 4758870 (1988-07-01), Hase et al.
patent: 4839702 (1989-06-01), Grinberg et al.
patent: 4845541 (1989-07-01), Xu et al.
patent: 4939562 (1990-07-01), Alderstein
patent: 4958208 (1990-09-01), Tanaka
patent: 4987463 (1991-01-01), Goronkin et al.
patent: 5001534 (1991-03-01), Lunardi et al.
patent: 5091759 (1992-02-01), Shih et al.
Hayes et al., "Hot electron transport in a graded band-gap base heterojunction bipolar transistor," Appl., Phys. Lett. 53(6), Aug. 8, 1988, pp. 490-491.
Kim et al., "GaAs/AlGaAs Heterojunction MISFET's Having 1-W/mm Power Density at 18.5 GHz," IEEE Electron Device Letters, vol. EDL-7, No. 11, Nov. 1986 pp. 638-639.
Su et al, "Double Heterojunction AlxGa.sub.l-x As/GaAs Bipolar Transistor CDHBJT's by MBE with a Current Gain of 1650," IEEE Electron Device Letters, vol. EDL-4, No. 5, May 1983, pp. 130-132.
Taylor et al., "Ledistor-a three-terminal double heterostructure opoelectronic switch", Feb. 9, 1987, pp. 338-340.
Ramberg et al. "Lattice-strained heterojunction InGaAs/GaAs bipolar structure & Recombination properties and device performance". Feb. 1, 1987 pp. 1234-1236.
Cooperman et al, 7 J. Vac. Sci. Tech. B 41, "Reactive Ion Etching of GaAs and AlGaAs in a BCl.sub.3 -Ar Discharge", 1989, pp. 41-46.
Donaldson Richard L.
Kesterson James C.
Larkins William D.
Matsil Ira S.
Texas Instruments Incorporated
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