Mesa type semiconductor device

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357 13, 357 52, H01L 2906

Patent

active

042153581

ABSTRACT:
A P type semiconductor layer is epitaxially grown on an N.sup.+ type semiconductor substrate to form a PN junction between them so as to expose its circumference to the peripheral surface of the substrate. The P type layer is formed into a mesa having a tilted surface to which the circumference of the PN junction is exposed. Then an N.sup.+ type diffusion layer is disposed on the tilted mesa surface to protect the PN junction.

REFERENCES:
patent: 3746587 (1973-07-01), Rosvold
patent: 3961356 (1976-06-01), Kool

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