1977-10-27
1980-07-29
Wojciechowicz, Edward J.
357 13, 357 52, H01L 2906
Patent
active
042153581
ABSTRACT:
A P type semiconductor layer is epitaxially grown on an N.sup.+ type semiconductor substrate to form a PN junction between them so as to expose its circumference to the peripheral surface of the substrate. The P type layer is formed into a mesa having a tilted surface to which the circumference of the PN junction is exposed. Then an N.sup.+ type diffusion layer is disposed on the tilted mesa surface to protect the PN junction.
REFERENCES:
patent: 3746587 (1973-07-01), Rosvold
patent: 3961356 (1976-06-01), Kool
Mitsui Shigeru
Takahashi Kazuhisa
Takamiya Saburo
Wataze Manabu
Mitsubishi Denki & Kabushiki Kaisha
Wojciechowicz Edward J.
LandOfFree
Mesa type semiconductor device does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Mesa type semiconductor device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Mesa type semiconductor device will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-907129