Merged device with aligned trench fet and buried emitter pattern

Active solid-state devices (e.g. – transistors – solid-state diode – Regenerative type switching device – Having only two terminals and no control electrode – e.g.,...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

257139, 257147, 257152, 257378, H01L 29744, H01L 29749

Patent

active

057104433

ABSTRACT:
A merged power device structure, of the emitter-switching type, in which the emitter of the bipolar power transistor has a minimum-width pattern which is aligned to the trenches of a trench control transistor. Thus the current density of the bipolar is maximized, since the emitter edge length per unit area is increased. The parasitic base resistance of the bipolar can also be reduced.

REFERENCES:
patent: 5304821 (1994-04-01), Hagino
patent: 5410170 (1995-04-01), Bulucea et al.
patent: 5471075 (1995-11-01), Shekar et al.
Blanchard, "A Power Transistor With an Integrated Thermal Feedback Mechanism, " Massachusetts Institute of Technology (1970).
Tukune, et al., "Spontaneous Polysilicon and Epitaxial Silicon Deposition,"J. Electrochem Soc., vol. 142, No. 5 (1995).

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Merged device with aligned trench fet and buried emitter pattern does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Merged device with aligned trench fet and buried emitter pattern, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Merged device with aligned trench fet and buried emitter pattern will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-727871

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.