Metal treatment – Process of modifying or maintaining internal physical... – Chemical-heat removing or burning of metal
Patent
1980-07-18
1982-03-02
Ozaki, G.
Metal treatment
Process of modifying or maintaining internal physical...
Chemical-heat removing or burning of metal
148172, 118415, H01L 21208
Patent
active
043176895
ABSTRACT:
Hg.sub.1-x Cd.sub.x Te is an important semiconductor for use in photovoltaic and photoconductive infrared photon detectors. Hg.sub.1-x Cd.sub.x Te can be grown by liquid phase epitaxy at atmospheric pressure from a Te-rich solution in which case the Hg vapor pressure is below 0.1 atm at 500.degree. C. This low vapor pressure makes possible the use of open-tube, slider growth techniques. The present invention describes a covered graphite slider system which provides an additional source of Hg, minimizes loss of Hg from the source wafer and virtually prevents loss of Hg from the (Hg.sub.1-x Cd.sub.x).sub.1-y Te.sub.y growth solution.
REFERENCES:
patent: 3305412 (1967-02-01), Pizzarello
patent: 3690965 (1972-09-01), Bergh et al.
patent: 3713900 (1973-01-01), Suzuki
patent: 3723190 (1973-03-01), Kruse et al.
patent: 3902924 (1975-09-01), Maciolek et al.
patent: 3933538 (1976-01-01), Akai et al.
patent: 3997377 (1976-12-01), Izawa et al.
patent: 4088514 (1978-05-01), Hara et al.
patent: 4089714 (1978-05-01), Johnson et al.
patent: 4105477 (1978-08-01), Johnson et al.
patent: 4105479 (1978-08-01), Johnson et al.
patent: 4115162 (1978-09-01), Pawlik et al.
Bowers John E.
Schmit Joseph L.
Dahle Omund R.
Honeywell Inc.
Ozaki G.
LandOfFree
Mercury containment for liquid phase growth of mercury cadmium t does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Mercury containment for liquid phase growth of mercury cadmium t, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Mercury containment for liquid phase growth of mercury cadmium t will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-58705