MEMS micromirror devices with anti-reflective structures

Details MEMS micromirror devices with anti-reflective structures MEMS micromirror devices with anti-reflective structures

2011-03-08

2011-03-08

Ben, Loha (Department: 2873)

Optical: systems and elements

Optical modulator

Light wave temporal modulation

C359S566000, C359S223100, C353S099000

Reexamination Certificate

active

07903318

ABSTRACT:
Diffractive patterns are disposed on a MEMS substrate in the gaps between the MEMS micromirrors to reduce backreflection of light leaking through the gaps and reflected by the MEMS substrate. The diffractive patterns are silicon surface-relief diffraction gratings or silicon oxide gratings on silicon substrate. Sub-wavelength gratings are used to suppress higher orders of diffraction; 50% duty cycle surface relief gratings on a substrate having index of refraction close to 3 are used to suppress both reflected and transmitted zero orders of diffraction simultaneously. The gratings have lines running parallel or at a slight angle to the gaps, to prevent the diffracted light from re-entering the gaps.

REFERENCES:
patent: 6061166 (2000-05-01), Furlani et al.
patent: 6810176 (2004-10-01), Frick et al.
patent: 6844959 (2005-01-01), Huibers et al.
patent: 7167613 (2007-01-01), Miller et al.

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