Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Reexamination Certificate
2006-03-14
2006-03-14
Berman, Jack I. (Department: 2881)
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
C250S42300F
Reexamination Certificate
active
07012266
ABSTRACT:
In accordance with the present invention, apparatus for performing electron beam lithography on selected portions of a substrate having a resist covered surface comprises a plurality of nanoscale electron emitters for emitting directional beams of electrons and, for each emitter, a directional control element to direct the emitted beam toward the selected portions. In a preferred embodiment the emitters comprise carbon nanotubes, and the directional control elements comprise micro-electro-mechanical disks in a two-dimensional array. In an alternative embodiment the directional control elements are electrodes.
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