Gas separation: processes – Selective diffusion of gases – Selective diffusion of gases through substantially solid...
Patent
1995-07-07
1997-03-18
Spitzer, Robert
Gas separation: processes
Selective diffusion of gases
Selective diffusion of gases through substantially solid...
96 13, 96 14, 525 61, B01D 5322, B01D 7128
Patent
active
056118430
ABSTRACT:
The present invention is directed toward a composition suitable for use in separating CO.sub.2 from gas streams containing CO.sub.2 especially H.sub.2 rich gas streams containing CO.sub.2 and CO. The composition comprises a hydrophylic polymer and at least one salt of an aminoacid, the salt of the aminoacid being present in an amount ranging from about 10 to about 80 wt % based on the total weight of the composition.
REFERENCES:
patent: 3507840 (1970-04-01), Hurlock
patent: 3840482 (1974-10-01), Bolto et al.
patent: 4419490 (1983-12-01), Bayer et al.
patent: 4561864 (1985-12-01), Klass et al.
patent: 4609468 (1986-09-01), Cramm
patent: 4705545 (1987-11-01), Polak et al.
patent: 4714482 (1987-12-01), Polak et al.
patent: 5015268 (1991-05-01), Ho
patent: 5041225 (1991-08-01), Norman
patent: 5096468 (1992-03-01), Minhas
patent: 5348569 (1994-09-01), Bikson et al.
patent: 5364454 (1994-11-01), Bikson et al.
patent: 5409525 (1995-04-01), Kazama et al.
patent: 5445669 (1995-08-01), Nakabayashi et al.
D.L. Ellig et al., "Concentration of Methane from Mixtures with Carbon Dioxide by Permeation Through Polymeric Films", J. Membr. Sci, No. 2, Apr. 1980, 259-263.
Dvorak Joseph J.
Exxon Research and Engineering Company
Spitzer Robert
LandOfFree
Membranes comprising salts of aminoacids in hydrophilic polymers does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Membranes comprising salts of aminoacids in hydrophilic polymers, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Membranes comprising salts of aminoacids in hydrophilic polymers will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1702700