Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1990-11-28
1992-01-21
Niebling, John
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
2041824, B01D 1302
Patent
active
050825496
ABSTRACT:
A membrane stack unit for performing a multichamber treatment of plural component fluids, composed of a plurality of sealing frames, membranes interposed between the frames, and two end plates with milegrated electrodes disposed at respective opposite ends of the unit with the frames and membranes interposed therebetween. Each frame has four side edges enclosing a region constituting a treatment chamber, with one pair of opposed side edges being provided with a set of through bores for conducting fluid, a set of second bores, and inlet and discharge channels each communicating with a respective second bore and with the chamber, and the second pair of opposed side edges being provided with through bores for conducting fluid. Each membrane is provided with openings aligned with all of the bores. The sealing frames are oriented relative to one another such that at least some of the through bores in one frame are aligned with respective ones of the second bores of another frame. Each end plate is provided with a plurality of bores forming flow paths with selected ones of the bores in the sealing frames, and a plurality of fluid flow channels communicating with the bores in that end plate, and a plurality of bores and two collecting channels for the entrance and discharge of the electrode rinse solution.
REFERENCES:
patent: 4303493 (1981-12-01), Kneifel et al.
patent: 4990230 (1991-02-01), Voss et al.
Kneifel Klemens
Martens Uwe
Voss Hartwig
Forschungszentrum Geesthacht GmbH
Niebling John
Phasge Arun S,.
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