Membrane mask for projection lithography

Details Membrane mask for projection lithography Membrane mask for projection lithography

1998-04-08

1999-11-16

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

059854936

ABSTRACT:
An improved, scattering-type mask for use in a charged-particle beam lithography process comprises the mask having a membrane portion and a scattering portion, the membrane portion being fabricated with a conductive material or a plurality of materials in which one of them is conductive. The conductive nature of the membrane portion mitigates the accumulation of charge in the mask, thereby enhancing the definition of the charged-particle pattern transferred from the mask onto the wafer under fabrication and reducing the distortion obtained with the system.

REFERENCES:
patent: 5759722 (1996-01-01), Nozue
patent: 5789119 (1997-05-01), Okino

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