Membrane for use in X-ray mask and method for preparing the same

Details Membrane for use in X-ray mask and method for preparing the same Membrane for use in X-ray mask and method for preparing the same

1987-10-21

1990-07-10

Bell, Mark L.

Compositions: ceramic

Ceramic compositions

Glass compositions, compositions containing glass other than...

501 96, 430 56, 430 62, 430 63, 430 84, C03C 0311, C04B 3558, C03G 1508

Patent

active

049408518

ABSTRACT:
A membrane for use in an X-ray mask composed of a compound comprising at least three kinds of elements of boron (B), silicon (Si) and nitrogen (N) in which the content of silicon in the compound is at least 15 atomic percent, but less than 100 atomic percent, and the atomic ratio of Si/(B+Si) in the compound is at least 0.2, but less than one. The membrane is synthesized from source gases including at least the foregoing three kinds of elements by chemical reaction under such conditions that the ratio of nitrogen to boron plus silicon is at least one in the source gases and thereby depositing a film of the compound onto a substrate. Since the membrane thus prepared has a high transmittance in the visible region and X-ray and their residual stress can be readily controlled by adjusting the conditions for the formation of the membrane, it is suitable for the preparation of X-ray masks.

REFERENCES:
patent: 4222760 (1980-09-01), Chyung et al.
patent: 4265991 (1981-05-01), Hirai et al.
patent: 4451547 (1984-05-01), Hirai et al.
patent: 4507375 (1985-03-01), Hirai et al.
patent: 4540674 (1985-09-01), Watanabe et al.
patent: 4552824 (1985-11-01), Hirai et al.

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