Membrane drying of gas feeds to low temperature units

Details Membrane drying of gas feeds to low temperature units Membrane drying of gas feeds to low temperature units

1989-09-29

1990-08-28

Spitzer, Robert

Gas separation

Means within gas stream for conducting concentrate to collector

55 31, 55 62, 55 75, 62 18, 62 27, B01D 5322

Patent

active

049522191

ABSTRACT:
A process is provided for the low temperature separation of a high purity gas product at lower power requirements by permeating a feed gas stream through a membrane having a water-to-gas-product selectivity of at least about 100, separating water from the gas stream, feeding the partially dried gas stream through a molecular sieve to remove residual water, and supplying the dried gas stream to a low temperature separation unit to separate gas product(s) from the gas stream.

REFERENCES:
patent: 4230463 (1980-10-01), Henis et al.
patent: 4560394 (1985-12-01), McDonald et al.
patent: 4595405 (1986-06-01), Agrawal et al.
patent: 4645516 (1987-02-01), Doshi
patent: 4654047 (1987-03-01), Hopkins et al.
patent: 4654063 (1987-03-01), Auvil et al.
patent: 4701187 (1987-10-01), Choe et al.
patent: 4717407 (1988-01-01), Choe et al.
patent: 4718921 (1988-01-01), Makino et al.
patent: 4732583 (1988-03-01), DeLong et al.
patent: 4759776 (1988-07-01), Langsam et al.
patent: 4761167 (1988-08-01), Nicholas et al.
patent: 4783201 (1988-11-01), Rice et al.
patent: 4783203 (1988-11-01), Doshi
patent: 4859215 (1989-08-01), Langsam et al.
patent: 4861351 (1989-08-01), Nicholas et al.
patent: 4863492 (1989-09-01), Doshi et al.

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