Member for a mask film, process for producing a mask film...

Details Member for a mask film, process for producing a mask film... Member for a mask film, process for producing a mask film...

2005-07-19

2005-07-19

Huff, Mark F. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S300000, C430S271100

Reexamination Certificate

active

06919148

ABSTRACT:
A member for a mask film comprising a substrate film transmitting ultraviolet light and a resin layer not transmitting ultraviolet light which is disposed on one face of the substrate film, allows elimination of color by irradiation with a laser beam, has a transmittance of ultraviolet light of 0.1% or smaller and has a thickness of 0.1 to 30 μm; a process for producing a mask film using the member; and a process for producing a printing plate of a photosensitive resin using the mask film. The mask is advantageously used for preparing a printing plate such as a photosensitive printing plate. The member for a mask provides the mask film by etching with a laser beam.

REFERENCES:
patent: 2002/0045131 (2002-04-01), Nagase et al.
patent: 05-24172 (1993-02-01), None
patent: 10-67088 (1998-03-01), None
U.S. Appl. No. 11/048,484, filed Feb. 1, 2005.

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