Melting and casting of high purity chromium with controlled oxyg

Specialized metallurgical processes – compositions for use therei – Processes – Free metal or alloy reductant contains magnesium

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29 34R, 420590, C22B 3432

Patent

active

060397888

ABSTRACT:
The present invention relates to a method of manufacturing high purity chromium suitable for deposition onto a semiconductor wafer or other substrate by sputtering. The process increases productivity, expands melting capability and provides consistent high purity chromium by reducing contamination by the dissolution of crucible material. The present invention provides for the addition of chromium oxide (Cr.sub.2 O.sub.3) to control oxygen content in chromium thereby producing high purity chromium ingots and protecting the ceramic crucibles from chemical attack by the liquid chromium.

REFERENCES:
patent: 3640700 (1972-02-01), Suzuki et al.
patent: 4504310 (1985-03-01), Boulier
patent: 5092921 (1992-03-01), Kobayashi et al.
patent: 5259866 (1993-11-01), Kobayashi et al.
patent: 5476248 (1995-12-01), Kobayashi et al.
WPIDS Abstract 79-191,22B of JP 54-13,408.
WPIDS Abstract 88-274,362 of JP 63-199,832.

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