Megasonic plating system

Details Megasonic plating system Megasonic plating system

1997-06-11

1999-02-02

Lamb, Brenda A.

Coating apparatus

Immersion or work-confined pool type

With tank structure, liquid supply, control, and/or...

118603, B05C 300

Patent

active

058658947

ABSTRACT:
A plating cell adapted for electro-less plating of articles, for example, semiconductor wafers contained in a carrier or "boat", incorporates a megasonic transducer in the plating cell and a rotational drive supporting the wafer carrier in the plating cell. The megasonic transducer applies acoustic energy at megasonic frequencies to the solution in the cell during a plating operation, and the carrier is rotated at a suitable speed, e.g., 45 to 60 r.p.m. A rapid drain is provided to remove the solution from the cell quickly at the end of a plating operation, and a pair of spray tubes with a series of spray nozzles rinses the wafers with de-ionized water. Spargers at the base of the cell inject the plating solution, which proceeds generally upwards in a laminar flow, and spills over a spillway at the top of the plating tank. The spillway comprises a series of triangular teeth which avoid waves or turbulence.

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patent: 5365960 (1994-11-01), Bran
patent: 5393347 (1995-02-01), Miranda
patent: 5520205 (1996-05-01), Guldi et al.
patent: 5578193 (1996-11-01), Aoki et al.

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