Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Patent
1984-08-28
1985-09-24
Caroff, Marc L.
Cleaning and liquid contact with solids
Processes
Including application of electrical radiant or wave energy...
134 18, 134113, 134184, B08B 312
Patent
active
045431302
ABSTRACT:
Cleaning apparatus for cleaning semiconductor wafers and the like in a chamber of cleaning fluid vibrating at ultrasonic (megasonic) frequencies utilizing an electrically energized transducer, such as a piezoelectric crystal, mounted on a conductive foil formed of tantalum or zirconium. Pinholes or other ruptures in the foil can cause high energy arcs capable of exploding vapors of inflammable solvents. The foil carrying the transducers is isolated from the cleaning fluid vapors by a closed buffer chamber containing an inert liquid that couples vibratory energy to the cleaning fluid and another closed chamber enclosing the transducers. Accordingly, cleaning fluids, such as the acetones, alcohols and ketones, heretofore considered hazardous fluids, can be used in the apparatus.
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Caroff Marc L.
Cohen Donald S.
Lazar Joseph D.
Morris Birgit E.
RCA Corporation
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