Megasonic cleaner and dryer system

Drying and gas or vapor contact with solids – Apparatus – With fluid current conveying of treated material

Reexamination Certificate

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Details

C034S317000, C034S058000, C034S667000, C034S337000, C134S001000, C134S001300, C134S095300, C134S184000, C134S198000

Reexamination Certificate

active

06928751

ABSTRACT:
An apparatus includes a rotatable chuck for supporting a substrate and a splash guard. The splash guard surrounds the chuck and surrounds a substrate mounted on the chuck. The splash guard has a portion that deflects fluid being flung off the substrate by centrifugal action in a manner so as to not splash back onto the substrate. The splash guard is moveable between a process position in which the upper annular edge of the splash guard extends above the chuck and a substrate on the chuck, and a load/unload position in which the splash guard is tilted so that one side of the upper annular edge is below an upper edge of the chuck. The movement of the splash guard facilitates loading and unloading of a substrate.

REFERENCES:
patent: 4537511 (1985-08-01), Frei
patent: 4902350 (1990-02-01), Steck
patent: 4966505 (1990-10-01), Winkler et al.
patent: 5427622 (1995-06-01), Stanasolovich et al.
patent: 5518542 (1996-05-01), Matsukawa et al.
patent: 5656097 (1997-08-01), Olesen et al.
patent: 5769566 (1998-06-01), Shea
patent: 5800626 (1998-09-01), Cohen et al.
patent: 5829156 (1998-11-01), Shibasaki et al.
patent: 5849104 (1998-12-01), Mohindra et al.
patent: 5964954 (1999-10-01), Matsukawa et al.
patent: 5985811 (1999-11-01), Masayuki et al.
patent: 6012470 (2000-01-01), Jones
patent: 6021789 (2000-02-01), Akatsu et al.
patent: 6039059 (2000-03-01), Bran
patent: 6140744 (2000-10-01), Bran
patent: 6325081 (2001-12-01), Miki et al.
patent: 6334902 (2002-01-01), Mertens et al.
patent: 6754980 (2004-06-01), Lauerhaas et al.
patent: 2002/0029788 (2002-03-01), Verhaverbeke et al.
patent: 198 33 197 (1999-02-01), None
patent: 0 905 746 (1999-03-01), None
patent: 0 905 747 (1999-03-01), None
patent: 1 168 419 (2002-01-01), None
patent: 61-179159 (1986-07-01), None
patent: 62-173935 (1987-07-01), None
patent: WO 98/01896 (1997-03-01), None
patent: WO 98/02905 (1998-01-01), None
patent: WO 99/16109 (1999-04-01), None
IBM Technical Disclosure Bulletin—vol. 37 No. 06A Jun. 1994.
“Ultra Pure Water Monitoring guidelines 2000”, Balazs Analytical Laboratory, 1999.
“Study on Megasonic in Advanced Wet Cleaning Process”, Electrochemical Society Proceedings vol. 95-20.
Nicolosi et al., “Front End of Line Wet Processing for Advanced Critical Cleans”, Electrochemical Society Proceedings Honolulu (1999).
Yi Wu “Development of an Experimentally Validated Model of Megasonic Cleaning”, Doctoral Thesis 1997.
Marc Heyns et al. “Ultra Clean Processing of Silicon Surfaces 2000”, Scitec Publications Ltd.
Paul W. Mertens et al. “A high-performance drying method enabling clustered single wafer wet cleaning”.

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