Drying and gas or vapor contact with solids – Process – By centrifugal force
Reexamination Certificate
2006-09-05
2006-09-05
Bennett, Henry (Department: 3743)
Drying and gas or vapor contact with solids
Process
By centrifugal force
C034S058000, C134S095200
Reexamination Certificate
active
07100304
ABSTRACT:
An apparatus for drying a generally flat substrate that has been cleaned has a rotatable support for supporting the substrate, a substrate drying assembly, and a controller. The substrate drying assembly includes a substrate drying assembly support arm, an outlet for applying liquid to an upper surface of the substrate, and an outlet for applying a drying vapor to the upper surface of the substrate. The substrate drying assembly is configured to position the liquid applying outlet and to position the vapor applying outlet above a portion of the substrate. The controller causes the substrate drying assembly to be retracted over the upper surface of the substrate at a faster rate near a center of the substrate than near a periphery of the substrate.
REFERENCES:
patent: 4178188 (1979-12-01), Dussault et al.
patent: 4326553 (1982-04-01), Hall
patent: 4401131 (1983-08-01), Lawson
patent: 4537511 (1985-08-01), Frei
patent: 4902350 (1990-02-01), Steck
patent: 5427622 (1995-06-01), Stanasolovick et al.
patent: 5518542 (1996-05-01), Matsukawa et al.
patent: 5656097 (1997-08-01), Olesen et al.
patent: 5800626 (1998-09-01), Cohen et al.
patent: 5849104 (1998-12-01), Mohindre et al.
patent: 5964954 (1999-10-01), Matsukawa et al.
patent: 5985811 (1999-11-01), Masayuki et al.
patent: 6021789 (2000-02-01), Akutsu et al.
patent: 6039059 (2000-03-01), Bran
patent: 6140744 (2000-10-01), Bran
patent: 6325081 (2001-12-01), Miki et al.
patent: 6334902 (2002-01-01), Mertens et al.
patent: 6468362 (2002-10-01), Chen et al.
patent: 2002/0029788 (2002-03-01), Verhaverbeke
patent: 19833197 (1999-02-01), None
patent: 0 905746 (1999-03-01), None
patent: 905747 (1999-03-01), None
patent: 1 168419 (2002-01-01), None
patent: 61-179159 (1986-07-01), None
patent: 62-173935 (1986-07-01), None
patent: WO/98/02905 (1998-01-01), None
patent: WO/98/01896 (1999-03-01), None
patent: WO/99/16109 (1999-04-01), None
IBM Technological Disclosure Bulletin vol. 37 No. 06A, Jun. 1994.
“Ultra Pure Monitoring Guidelines 2000” Balaz Analytical Laboratory 1999.
“Study on Megasonic In Advanced Wet Cleaning Process”, Electrochemical Society Proceedings vol. 95-20.
Nicolosi et al. “Front End of Wet Line Processing for Advanced Critical Cleans” Electrochemical Society Proceedings Honolulu 1999.
Yi Wu “Development of an Experimentally Validated Model of Megasonic Cleaning” Doctoral Thesis 1997.
Marc Heyns, et al. Ultra Clean Processing of Silicon Surfaces 2000 Scitec Publications, Ltd.
Paul W. Mertens, et al., “A high-performance drying method enabling clustered single wafer wet cleaning.”
Fyen William
Lauerhaas Jeffrey M.
Mertens Paul
Nicolosi, Jr. Thomas J.
Akrion Technologies, Inc.
Belles Brian L.
Bennett Henry
Nguyen Camtu
Wolf Block Schorr & Solis-Cohen
LandOfFree
Megasonic cleaner and dryer does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Megasonic cleaner and dryer, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Megasonic cleaner and dryer will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3554883