Media drying system and method

Drying and gas or vapor contact with solids – Material treated by electromagnetic energy – Infrared energy

Reexamination Certificate

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Details

C347S102000

Reexamination Certificate

active

07424781

ABSTRACT:
A media drying system and method are provided. The drying system includes a media support having a first surface and a second surface. The first surface defines a media travel path. A heater is positioned spaced apart from the second surface of the media support with the second surface of the media support being located between the heater and the first surface of the media support.

REFERENCES:
patent: 3158509 (1964-11-01), Hudson
patent: 4225333 (1980-09-01), Frank
patent: 4260648 (1981-04-01), Jacobe et al.
patent: 4816912 (1989-03-01), Suzuki et al.
patent: 5005025 (1991-04-01), Miyakawa et al.
patent: 5025292 (1991-06-01), Steele
patent: 5244529 (1993-09-01), Siegel
patent: 5633668 (1997-05-01), Schwiebert et al.
patent: 6048059 (2000-04-01), Wafler
patent: 6092891 (2000-07-01), Okubo et al.
patent: 6308626 (2001-10-01), Crystal et al.
patent: 6390618 (2002-05-01), Wotton et al.
patent: 6536894 (2003-03-01), Rasmussen et al.
patent: 2002/0175795 (2002-11-01), Fuseya et al.
patent: 2003/0081097 (2003-05-01), Gil et al.
patent: 2003/0128253 (2003-07-01), Kitahara et al.
patent: 2003/0137573 (2003-07-01), Rasmussen et al.
patent: 0598564 (1994-05-01), None
patent: 1336505 (2003-08-01), None

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