Mechanism for cleaning a cylinder of an offset lithographic prin

Details Mechanism for cleaning a cylinder of an offset lithographic prin Mechanism for cleaning a cylinder of an offset lithographic prin

1977-06-30

1979-01-23

Fisher, J. Reed

Printing

Cleaning attachments

101156, B41F 3506, B41L 4106

Patent

active

041354486

ABSTRACT:
An improved mechanism for cleaning a driven blanket cylinder in an offset lithographic printing press is described. In the mechanism, a wash cloth is fed from a magazine roller over a pressure roller to a take-up roller. The pressure roller can be brought to bear against the dirty surface of the blanket cylinder with the wash cloth therebetween. The wash cloth is wetted by spraying a cleaning fluid thereon immediately prior to its encountering the pressure roller. The wet wash cloth is thus brought into contact with the dirty surface of the blanket cylinder which is then rotated against the cloth to cleanse the surface. After the surface is clean, dry cloth can be brought into contact with the blanket cylinder by merely not activating the fluid spray. Means are provided in the preferred embodiments for agitating the cleaning fluid to keep it well-mixed and means are also provided for collecting and reusing any excess cleaning fluid which may be dispensed.

REFERENCES:
patent: 282995 (1883-08-01), Lee
patent: 1889376 (1932-11-01), Renck
patent: 2525982 (1950-10-01), Wescott
patent: 2672812 (1954-03-01), Luehrs
patent: 3084626 (1963-04-01), Stobb
patent: 3120805 (1964-02-01), Simon
patent: 3207070 (1965-09-01), Klingler et al.
patent: 3309993 (1967-03-01), Grembecki et al.
patent: 3411444 (1968-11-01), Boneschi
patent: 3507215 (1970-04-01), Schuhmann
patent: 3583684 (1971-06-01), Schippers
patent: 3658003 (1972-04-01), Johnson
patent: 3735702 (1973-05-01), Kossak
patent: 3850099 (1974-11-01), Laben

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