Mechanism and method for holding a substrate on a substrate stag

Heat exchange – With retainer for removable article – Electrical component

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269 21, 269903, 118728, F28F 700

Patent

active

060125098

ABSTRACT:
A mechanism for holding a substrate on a substrate stage of a substrate treatment apparatus according to the present invention comprises an exhaust mechanism section connected to the substrate treatment apparatus having the substrate stage therein and used to discharge a gas from the substrate treatment apparatus by suction, and a holding mechanism section having one end portion formed with a plurality of intake holes opening in the upper surface of the substrate stage on which the substrate is placed and the other end portion connected to the exhaust mechanism section, whereby the sucking force of the exhaust mechanism section is caused to act on the intake holes so that the substrate is held on the substrate stage by suction. A method for holding a substrate on a substrate stage of a substrate treatment apparatus according to the invention comprises steps of keeping the pressure in the substrate treatment apparatus at a predetermined vacuum pressure while discharging a gas from the substrate treatment apparatus having a substrate stage therein by suction, causing a sucking force for discharging the gas from the substrate treatment apparatus to act on a plurality of intake holes opening in a bearing surface of the substrate stage on which the substrate is to be placed, and placing the substrate on the bearing surface of the substrate stage on which the sucking force acts through the intake holes, thereby holding the whole area of the substrate on the bearing surface of the substrate stage.

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patent: 4903754 (1990-02-01), Hirscher et al.
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patent: 5191218 (1993-03-01), Mori et al.
patent: 5509464 (1996-04-01), Turner et al.
patent: 5542559 (1996-08-01), Kawakami et al.
patent: 5778968 (1998-07-01), Hendrickson et al.

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