Optics: measuring and testing – Lamp beam direction or pattern
Reexamination Certificate
2005-12-06
2005-12-06
Pham, Hoa Q. (Department: 2877)
Optics: measuring and testing
Lamp beam direction or pattern
C355S053000
Reexamination Certificate
active
06972836
ABSTRACT:
There is disclosed a measuring method of illuminance unevenness of an exposure apparatus in which the illuminance unevenness resulting from a projection optical system, to project the light passed through the photomask onto the finite area on the photosensitive substrate via the projection optical system and to expose the photomask to the light, the method comprising calculating an average value of transmittance of the projection optical system of each path of the light emitted from one point of the photomask and reaching an imaging point for each of a plurality of imaging points in the finite area on the photosensitive substrate, and calculating the illuminance unevenness in the finite area on the photosensitive substrate from the average value of the transmittance obtained for each imaging point.
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Inoue Soichi
Sato Kazuya
Tanaka Satoshi
Finnegan Henderson Farabow Garrett & Dunner L.L.P.
Pham Hoa Q.
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