Measuring method of illuminance unevenness of exposure...

Optics: measuring and testing – Lamp beam direction or pattern

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C355S053000

Reexamination Certificate

active

06972836

ABSTRACT:
There is disclosed a measuring method of illuminance unevenness of an exposure apparatus in which the illuminance unevenness resulting from a projection optical system, to project the light passed through the photomask onto the finite area on the photosensitive substrate via the projection optical system and to expose the photomask to the light, the method comprising calculating an average value of transmittance of the projection optical system of each path of the light emitted from one point of the photomask and reaching an imaging point for each of a plurality of imaging points in the finite area on the photosensitive substrate, and calculating the illuminance unevenness in the finite area on the photosensitive substrate from the average value of the transmittance obtained for each imaging point.

REFERENCES:
patent: 5067811 (1991-11-01), Ouchi
patent: 5160962 (1992-11-01), Miura et al.
patent: 5633713 (1997-05-01), Tanaka et al.
patent: 5677754 (1997-10-01), Makinouchi
patent: 5717483 (1998-02-01), Kikuchi
patent: 5894341 (1999-04-01), Nishi et al.
patent: 5973771 (1999-10-01), Hibbs et al.
patent: 6048651 (2000-04-01), Brunner et al.
patent: 6127095 (2000-10-01), Kudo
patent: 6285442 (2001-09-01), Sato
patent: 6317198 (2001-11-01), Sato et al.
patent: 6771350 (2004-08-01), Nishinaga
patent: 7-192995 (1995-07-01), None
patent: 2001-230179 (2001-08-01), None
patent: 2002/031570 (2002-04-01), None
K. Sato et al., “Measurement of Effective Source Shift Using a Grating-Pinhole Mask”, SPIE Conference on Optical Microlithography XII, vol. 3679, pp. 99-107, (Mar. 1999).
J.P. Kirk et al., “Pupil Illumunation; in Situ Measurement of Partial Coherence”, SPIE vol. 3334, pp. 281-288, (Feb. 1998).
J. Kirk et al., “Pinholes and Pupil Fills”, Microlithography World, pp. 25-34, (Autumn 1997).
K. Sato et al., “Measurement of Transmittance Variation of Projection Lenses Depending on the Light Paths Using a Grating-Pinhole Mask”, Optical Microlithography, Proceedings of SPIE, vol. 4346, pp. 379-386, (Feb. 2001).
K. Sato et al., “Method for Inspecting Exposure Apparatus”, pending U.S. Appl. No. 09/783,295, filed Feb. 15, 2001.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Measuring method of illuminance unevenness of exposure... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Measuring method of illuminance unevenness of exposure..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Measuring method of illuminance unevenness of exposure... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3519064

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.