Measuring method and apparatus using attenuation in total...

Details Measuring method and apparatus using attenuation in total... Measuring method and apparatus using attenuation in total...

2005-03-08

2005-03-08

Evans, F. L. (Department: 2877)

Optics: measuring and testing

Of light reflection

Reexamination Certificate

active

06864984

ABSTRACT:
A plurality of measuring units each comprising a dielectric block, a metal film layer which is formed on a surface of the dielectric block and a sample holder are supported on a support. The support is moved by a support drive means to bring in sequence the measuring units to a measuring portion comprising an optical system which projects a light beam emitted from a light source, and a photodetector which detects attenuation in total internal reflection by detecting the intensity of the light beam which is reflected in total internal reflection at the interface between the dielectric block and the metal film layer. In this measuring apparatus, lots of samples can be measured in a short time.

REFERENCES:
patent: 4979821 (1990-12-01), Schutt et al.
patent: 4997278 (1991-03-01), Finlan et al.
patent: 5017009 (1991-05-01), Schutt et al.
patent: 5917607 (1999-06-01), Naya
patent: 0 797 091 (1997-09-01), None
patent: 61-226644 (1986-10-01), None
patent: 1-138443 (1989-05-01), None
patent: 5-5734 (1993-01-01), None
patent: 6-167443 (1994-06-01), None
patent: 7-159319 (1995-06-01), None
patent: 8-43407 (1996-02-01), None
patent: 10-239233 (1998-09-01), None
patent: 10-267841 (1998-10-01), None
patent: 10-281981 (1998-10-01), None
patent: 10-281982 (1998-10-01), None
patent: 10-300667 (1998-11-01), None
patent: 10-339374 (1998-12-01), None
patent: 10-339732 (1998-12-01), None
patent: 11-51857 (1999-02-01), None
patent: 2000-55805 (2000-02-01), None
patent: 2000-65729 (2000-03-01), None
patent: 2000-66008 (2000-03-01), None
International Search Report Okamoto, “Spectrum Researches”, vol. 47, No. 1(1998), pp. 21 to 23 & pp. 26 and 27.

Affiliated with

Also associated with

Rating

Measuring method and apparatus using attenuation in total... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Measuring method and apparatus using attenuation in total..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Measuring method and apparatus using attenuation in total... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3440181