Measuring method and apparatus for meausring the positional rela

Details Measuring method and apparatus for meausring the positional rela Measuring method and apparatus for meausring the positional rela

1991-03-26

1994-07-26

Turner, Samuel A.

Optics: measuring and testing

By dispersed light spectroscopy

Utilizing a spectrometer

356363, 356401, G01B 1102

Patent

active

053330501

ABSTRACT:
Disclosed is a method and apparatus for measuring a relative positional deviation between a first pattern and a second pattern, printed on an article such as a semiconductor wafer at different moments, the measurement being based on detection of interference of diffraction lights from at least one of the first and second printed patterns.

REFERENCES:
patent: 4710026 (1987-12-01), Magome et al.
patent: 4984890 (1991-01-01), Tojo et al.
patent: 4988197 (1991-01-01), Ishibashi et al.
patent: 5028797 (1991-07-01), Abe et al.
Suzuki, et al., "An Optical-Heterodyne Alignment Technique for Quarter-Micron X-Ray Lithography," Journal of Vacuum Science & Technology, B7, No. 6, Nov. 1988, pp. 1971 through 1976.

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