Measuring layer thickness or composition changes

Data processing: measuring – calibrating – or testing – Measurement system – Dimensional determination

Reexamination Certificate

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Reexamination Certificate

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11262868

ABSTRACT:
A method of measuring the thickness or the rate of change of thickness of a layer as the layer is being formed on a substrate, includes illuminating the layer through the substrate with low coherence light that transmits through the layer; collecting a portion of the reflected light from each optical interface of the substrate and layer with a low coherence interferometer; and, calculating the thickness or the rate of change of thickness of the layer according to the obtained interferometric data.

REFERENCES:
patent: 6513451 (2003-02-01), Van Slyke et al.
patent: 6646753 (2003-11-01), Zhang et al.
patent: 2002/0097406 (2002-07-01), Fielden et al.
patent: 2003/0169433 (2003-09-01), Koele et al.
patent: 2004/0008435 (2004-01-01), Takahashi et al.
patent: 2004/0131300 (2004-07-01), Atanasov
patent: 2004/0239953 (2004-12-01), Flynn
patent: 2005/0046850 (2005-03-01), Chow
patent: 2006/0012582 (2006-01-01), De Lega
patent: 2004134154 (2004-04-01), None

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