Measuring instrument for X-ray structure determinations of liqui

Details Measuring instrument for X-ray structure determinations of liqui Measuring instrument for X-ray structure determinations of liqui

1981-07-17

1984-10-02

Church, Craig E.

X-ray or gamma ray systems or devices

Specific application

Diffraction, reflection, or scattering analysis

378 86, G01N 2320

Patent

active

044752253

ABSTRACT:
The present invention relates to an instrument for measuring the variations in intensity of a beam of X-rays scattered by liquid or amorphous solid materials, which comprises: a goniometric head carrying said material and mounted rotationally movable, a position sensitive proportional detector mounted movable along a radial supporting arm, with a rotational motion which is coaxial to the motion of said goniometric head, and having an angular amplitude twice that of the angular change of location of said head, and a monochromator situated on the X-ray beam. Such an instrument is specially designed for liquid or amorphous solid materials, which only scatter an X-ray beam with a very low intensity. The monochromator or said instrument is located on the path of the beam of X-rays scattered by said liquid or amorphous solid material, after the latter and before said position sensitive proportional detector.

REFERENCES:
patent: 3105902 (1963-10-01), Ostrofsky
patent: 4076981 (1978-02-01), Sparks
A. Saint-Etienne "X-ray Residual Stress Measurement with a Position Sensitive Proportional Detextor" (translated title), Mecantique Materiaux Electricite, 1976, vol. 59 No. 318 et No. 319, pp. 39-41.

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