Measuring device and process for recording on electrodeposition

Details Measuring device and process for recording on electrodeposition Measuring device and process for recording on electrodeposition

1975-10-22

1978-07-25

Prescott, Arthur C.

Chemistry: electrical and wave energy

Apparatus

Coating, forming or etching by sputtering

204181C, 324 29, C25D 1300, C25D 1322

Patent

active

041027710

ABSTRACT:
A method and arrangement for measuring and recording parameters relative to the onset of coagulation and the build-up of film resistance within an electrodeposition bath system. A rapid voltage rise across the bath system is detected by the arrangement, the rapid rise indicating the onset of coagulation, and the parameters are recorded. Parameters are further recorded by the arrangement during the period of build-up of film resistance.

REFERENCES:
patent: 3502563 (1970-03-01), Schmidt
patent: 3627661 (1971-12-01), Gordon et al.
patent: 3707446 (1972-12-01), Oyabu et al.
patent: 3935085 (1976-01-01), Baker, Jr. et al.
Yeates, "Electropainting," Draper, Ltd. (1966), pp. 41-46.

Affiliated with

Also associated with

Rating

Measuring device and process for recording on electrodeposition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Measuring device and process for recording on electrodeposition , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Measuring device and process for recording on electrodeposition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1419479