Measuring configuration and method for measuring a critical...

Radiant energy – Photocells; circuits and apparatus – Photocell controls its own optical systems

Reexamination Certificate

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Reexamination Certificate

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06897422

ABSTRACT:
A scanning electron microscope is integrated in a common measuring configuration with at least one device for the angle-dependent measuring of the scattering or diffraction of light. This measuring configuration includes a common transport system, which handles the distribution of semiconductor wafers that are to be measured. The measuring configuration also includes at least one loading and unloading station for providing semiconductor wafers in wafer transport containers. The joint configuration of the two-measuring devices for measuring the critical dimension of a feature allows a mostly contamination-free, rapid, and flexible exchange between the two measuring devices, and furthermore the measuring of lots can be planned in accordance with various measuring strategies. In particular, each semiconductor wafer of a lot can be measured without resorting to sampling strategies. Certainty is enhanced with respect to wafer-to-wafer uniformity, and a greater throughput is achieved.

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Michael Brain et al.: “Emerging Needs For Continuous Flow FOUP Transport”, 1999IEEE/CPMT Int'l Manufacturing Technology Symposium, pp. 76-82.

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